We report about the realization of a negative-tone photoresist for two-photon lithography containing superparamagnetic iron-oxide nanoparticles at 0.1 wt.% concentration. The material was characterized in terms of optical transparence in the visible spectral range and the microfabrication process engineered in order to minimize particles agglomeration. The versatility of two-photon direct laser writing allowed us to fabricate three-dimensional structures with sub-micrometer resolution, letting us envision possible applications of this nanocomposite blend for the realization of complex magnetically actuated MEMS.
Magnetically active polymeric nanocomposites for two-photon stereolithography
Quarta A;
2014
Abstract
We report about the realization of a negative-tone photoresist for two-photon lithography containing superparamagnetic iron-oxide nanoparticles at 0.1 wt.% concentration. The material was characterized in terms of optical transparence in the visible spectral range and the microfabrication process engineered in order to minimize particles agglomeration. The versatility of two-photon direct laser writing allowed us to fabricate three-dimensional structures with sub-micrometer resolution, letting us envision possible applications of this nanocomposite blend for the realization of complex magnetically actuated MEMS.File in questo prodotto:
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