We present an apparatus for controlling the deposition of thin films. The apparatus is based on a quartz resonator whose frequency is controlled digitally by a computer. Temperature variations of the quartz during the evaporation process, attributed to the exothermic heat of condensation and radiation heating from the evaporation source, are compensated. A very stable deposition rate and a good film thickness evaluation are obtained.

PC-based digital apparatus with temperature compensation for measurement of thin films during deposition

Barchesi C;Luce M;
1993

Abstract

We present an apparatus for controlling the deposition of thin films. The apparatus is based on a quartz resonator whose frequency is controlled digitally by a computer. Temperature variations of the quartz during the evaporation process, attributed to the exothermic heat of condensation and radiation heating from the evaporation source, are compensated. A very stable deposition rate and a good film thickness evaluation are obtained.
1993
thin films deposition; compensated quartz; deposition; thickness monitor
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/311893
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