The so called spray-pyrolisys is a well known technique used to deposit thin films of transparent conductive oxides like doped-tin dioxide. The technique consists in hydrolizing an areosol on the surface of a heated substrate. Among the properties are the possibility to deposit thin films over very large areas with good uniformity and the relatively small cost compared with other types of deposition systems. Applications that require low cost and large area uniformity are in display and solar cell fabrication. This work is supported by the ESPRIT project "PROFELICITA" which has to develop an analog grey scale ferroelectric liquid crystal display. The apparatus is divided in two major parts, the areosol chamber and the deposition chamber of new design. In the areosol chamber a solution of stannic chloride and bismuth chloride is properly atomized using nitrogen as the carrier gas. The deposition chamber consists of a flat rotating hot plate that can house substrates up to 18 cm in diameter and of a diffusor consisting in a pirex glass ring surrounding the hot plate.
An improved spray-pyrolysis deposition system for transparent conductive oxide thin films
A Bearzotti;V Foglietti;
1995
Abstract
The so called spray-pyrolisys is a well known technique used to deposit thin films of transparent conductive oxides like doped-tin dioxide. The technique consists in hydrolizing an areosol on the surface of a heated substrate. Among the properties are the possibility to deposit thin films over very large areas with good uniformity and the relatively small cost compared with other types of deposition systems. Applications that require low cost and large area uniformity are in display and solar cell fabrication. This work is supported by the ESPRIT project "PROFELICITA" which has to develop an analog grey scale ferroelectric liquid crystal display. The apparatus is divided in two major parts, the areosol chamber and the deposition chamber of new design. In the areosol chamber a solution of stannic chloride and bismuth chloride is properly atomized using nitrogen as the carrier gas. The deposition chamber consists of a flat rotating hot plate that can house substrates up to 18 cm in diameter and of a diffusor consisting in a pirex glass ring surrounding the hot plate.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
