Characterization of Titanium Dioxide thin films produced by RF plasma sputtering technique for photocatalytic applications

In the present work Titanium Dioxide thin films were successfully prepared both on FTO and (1 0 0) Silicon substrates by means of radiofrequency plasma sputtering technique. AFM, XRD, SEM and contact angle measurements were performed in order to characterize the samples. XRD measurements revealed a crystalline structure for all the samples, with a mean globular size in the range of 20 - 30 nm. All samples showed a reversible hydrophilic behavior due to UV irradiation, that can be correlated with their photocatalytic properties.