The Tandetron accelerator of CNR-IMM has been fully dedicated to industrial research activities and it is now hosted by MIST E-R consortium, a Laboratory of the High Technology Network of Emilia-Romagna. Through the development of enabling micro and nanotechnologies, the Laboratory contributes to the construction of an Integrated Manufacturing Platform to lead the development of new products and new market areas for the regional enterprises. An outline of the facility and the main applications will be presented. As an example, one of the most prominent activities concerns the fabrication of lithium niobate integrated optics by high energy ion implantation. For this application ion beams are employed in various steps of the device fabrication process, such as the tailoring of the surface refractive index by damage engineering and the surface micromachining by ion implantation-assisted wet etching. Some examples of devices produced with the above mentioned techniques, in collaboration with national and international industrial partners, will be showed.
Industrial research activities at the Tandetron accelerator of Bologna
2012
Abstract
The Tandetron accelerator of CNR-IMM has been fully dedicated to industrial research activities and it is now hosted by MIST E-R consortium, a Laboratory of the High Technology Network of Emilia-Romagna. Through the development of enabling micro and nanotechnologies, the Laboratory contributes to the construction of an Integrated Manufacturing Platform to lead the development of new products and new market areas for the regional enterprises. An outline of the facility and the main applications will be presented. As an example, one of the most prominent activities concerns the fabrication of lithium niobate integrated optics by high energy ion implantation. For this application ion beams are employed in various steps of the device fabrication process, such as the tailoring of the surface refractive index by damage engineering and the surface micromachining by ion implantation-assisted wet etching. Some examples of devices produced with the above mentioned techniques, in collaboration with national and international industrial partners, will be showed.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
