N-type TiO2-x and In2O3 · SnO 2 thin films were deposited onto p-type porous silicon layer which was for-med by common electrochemical anodization. The current-voltage characteristics of obtained structures and sensitivity to different concentrations of hydrogen in air were studied. Measurements were carried out at room temperature. As shown results of measurements, an exponential growth of the current in forward branch of the current-voltage characteristics of the device made of TiO2-x layer was detected. Higher sen-sitivity to hydrogen of the TiO2-x-porous silicon sensor in comparison to structure made of In2O3 · SnO2 film was detected at room temperature (without preheating of work body of the sensor).
Room temperature gas sensor based on porous silicon/metal oxide structure
Galstyan VE;
2007
Abstract
N-type TiO2-x and In2O3 · SnO 2 thin films were deposited onto p-type porous silicon layer which was for-med by common electrochemical anodization. The current-voltage characteristics of obtained structures and sensitivity to different concentrations of hydrogen in air were studied. Measurements were carried out at room temperature. As shown results of measurements, an exponential growth of the current in forward branch of the current-voltage characteristics of the device made of TiO2-x layer was detected. Higher sen-sitivity to hydrogen of the TiO2-x-porous silicon sensor in comparison to structure made of In2O3 · SnO2 film was detected at room temperature (without preheating of work body of the sensor).I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
