A procedure for fabricating all refractory superconducting tunnel junctions with a semiconducting barrier has been developed. The process is based on the deposition of a four-layer Nb-Al-CdS-Nb structure without breaking the vacuum. The photoconducting properties of the barrier produce a light-sensitive behavior of the junctions. Preliminary measurements have shown the occurrence of light induced quasiparticle tunneling. © 1996 American Institute of Physics.

All refractory light-sensitive superconductive junctions

Granata C;
1996

Abstract

A procedure for fabricating all refractory superconducting tunnel junctions with a semiconducting barrier has been developed. The process is based on the deposition of a four-layer Nb-Al-CdS-Nb structure without breaking the vacuum. The photoconducting properties of the barrier produce a light-sensitive behavior of the junctions. Preliminary measurements have shown the occurrence of light induced quasiparticle tunneling. © 1996 American Institute of Physics.
1996
Josephson effect
tunnel junctions
semiconducting barrier
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/334464
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