Tensile-strained Ge/Si(1-x)Ge(x) (x = 0.87) multiple quantum wells (MQWs) on a Ge-on-Si virtual substrate are investigated with Brewster transmission and photo-reflectance, to identify quantum-confined direct-gap transitions and their light/heavy-hole splitting. Strain is deduced from optical splitting and x-ray diffraction measurements. As-prepared MQWs have an exciton at approximate to 820 meV, close to the 810 meV edge of the telecommunication C-band. The effect of rapid thermal annealing, to red-shift this feature into the C-band via increased strain, is investigated and interpreted with a tight-binding model. Annealing is observed to red-shift bulk absorption, but MQW transitions experience a net blue-shift due to interdiffusion. (C) 2011 American Institute of Physics.

Quantum-confined direct-gap transitions in tensile-strained Ge/SiGe multiple quantum wells

Virgilio M;
2011

Abstract

Tensile-strained Ge/Si(1-x)Ge(x) (x = 0.87) multiple quantum wells (MQWs) on a Ge-on-Si virtual substrate are investigated with Brewster transmission and photo-reflectance, to identify quantum-confined direct-gap transitions and their light/heavy-hole splitting. Strain is deduced from optical splitting and x-ray diffraction measurements. As-prepared MQWs have an exciton at approximate to 820 meV, close to the 810 meV edge of the telecommunication C-band. The effect of rapid thermal annealing, to red-shift this feature into the C-band via increased strain, is investigated and interpreted with a tight-binding model. Annealing is observed to red-shift bulk absorption, but MQW transitions experience a net blue-shift due to interdiffusion. (C) 2011 American Institute of Physics.
2011
Istituto Nanoscienze - NANO
PHOTOREFLECTANCE; SI
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/338589
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