Control of liquid crystal (LC) orientation using a proper SiO2 alignment layer is essential for the optimization of vertically aligned nematic (VAN) displays. With this aim, we studied the optical anisotropy of thin SiO2 films by generalized ellipsometry as a function of deposition angle. The columnar SiO2 structure orientation measured by a noninvasive ellipsometry technique is reported for the first time, and its morphology influence on the LC alignment is demonstrated for large deposition angles.

Morphology of SiO2 films as a key factor in alignment of liquid crystals with negative dielectric anisotropy

Marino Antigone;
2016

Abstract

Control of liquid crystal (LC) orientation using a proper SiO2 alignment layer is essential for the optimization of vertically aligned nematic (VAN) displays. With this aim, we studied the optical anisotropy of thin SiO2 films by generalized ellipsometry as a function of deposition angle. The columnar SiO2 structure orientation measured by a noninvasive ellipsometry technique is reported for the first time, and its morphology influence on the LC alignment is demonstrated for large deposition angles.
2016
Istituto di Scienze Applicate e Sistemi Intelligenti "Eduardo Caianiello" - ISASI
anisotropy
ellipsometry
liquid crystal alignment
morphology
thin film
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/342104
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