Carbon nanotubes are emerging substrates for guiding neuronal cell growth. Here we investigate the influence of multiscale 3D architecture of single-walled carbon nanotubes (SWCNT) on the adhesion of human neuronal cells (neuroblastoma SHSY5Y). 3D patterns of SWCNT were fabricated by a templating process to yield a hexagonal array of interconnected SWCNT semicapsules with controlled multiscale porosity, and integrated between Pt electrodes. Neuronal cells adhered preferentially to the SWCNT semicapsules with respect to either silicon oxide or disordered networks of SWCNT. Morphological cell features (size and shape) were evaluated upon application of an electric field across SWCNT pattern. Cell adhesion is enhanced by an electric field above 1 V cm1, whereas it is completely depleted at 5 V cm1. This shows the possibility to tune neuronal cell adhesion across different regimes by means of 3D pattern and voltage-biasing SWCNT

Control of neuronal cell adhesion on single-walled carbon nanotubes 3D patterns

C Dionigi;B Chelli;I Tonazzini;F Biscarini
2010

Abstract

Carbon nanotubes are emerging substrates for guiding neuronal cell growth. Here we investigate the influence of multiscale 3D architecture of single-walled carbon nanotubes (SWCNT) on the adhesion of human neuronal cells (neuroblastoma SHSY5Y). 3D patterns of SWCNT were fabricated by a templating process to yield a hexagonal array of interconnected SWCNT semicapsules with controlled multiscale porosity, and integrated between Pt electrodes. Neuronal cells adhered preferentially to the SWCNT semicapsules with respect to either silicon oxide or disordered networks of SWCNT. Morphological cell features (size and shape) were evaluated upon application of an electric field across SWCNT pattern. Cell adhesion is enhanced by an electric field above 1 V cm1, whereas it is completely depleted at 5 V cm1. This shows the possibility to tune neuronal cell adhesion across different regimes by means of 3D pattern and voltage-biasing SWCNT
2010
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
GRID-ASSISTED DEPOSITION; FIELD-EFFECT TRANSISTORS; SMOOTH-MUSCLE-CELLS; NEURITE GROWTH; SOFT-LITHOGRAPHY; ELECTRIC-FIELDS; STIMULATION; FABRICATION; FUNCTIONALIZATION; REGENERATION
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/34721
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