Sequential and parallel localoxidation nanolithographies have been applied to pattern pentacene samples by creating a variety of nanostructures. The sequential localoxidation process is performed with an atomic force microscope and requires the application of a sequence of voltage pulses of 36 V for 1 ms. The parallel localoxidation process is performed by using a conductive and patterned stamp. Then, a voltage pulse is applied between the stamp and the pentacenesurface. Patterns formed by arrays of parallel lines covering 1 mm2 regions and with a periodicity of less than 1 ?m have been generated in a few seconds. We also show that the patterns can be used as templates for the deposition of antibodies.

Patterning pentacene surfaces by local oxidation nanolithography

E Bystrenova;F Biscarini;
2010-01-01

Abstract

Sequential and parallel localoxidation nanolithographies have been applied to pattern pentacene samples by creating a variety of nanostructures. The sequential localoxidation process is performed with an atomic force microscope and requires the application of a sequence of voltage pulses of 36 V for 1 ms. The parallel localoxidation process is performed by using a conductive and patterned stamp. Then, a voltage pulse is applied between the stamp and the pentacenesurface. Patterns formed by arrays of parallel lines covering 1 mm2 regions and with a periodicity of less than 1 ?m have been generated in a few seconds. We also show that the patterns can be used as templates for the deposition of antibodies.
2010
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
Organic semiconductor; Pentacene; AFM nanolithography; Localoxidation; Nanolithography; Tip-based nanofabrication
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/34726
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