Typical XUV pulse intensity required to produce nonlinear processes is of the order of 1012-1014 W/cm2 [1], which can be achieved by increasing the energy of the XUV pulses and/or by decreasing the corresponding spot size in the target region. Additional requirements are the following: (i) use of a setup characterized by a sufficiently long exit arm, while maintaining a compact size, in order to accommodate different experimental devices in the target region; (ii) generation of two XUV pulse replica, with adjustable temporal delay (accuracy of the order of 10 as).
High-throughput and microfocusing capabilities of a beamline for attosecond pulses based on toroidal mirrors
F Frassetto;M Nisoli;L Poletto
2015
Abstract
Typical XUV pulse intensity required to produce nonlinear processes is of the order of 1012-1014 W/cm2 [1], which can be achieved by increasing the energy of the XUV pulses and/or by decreasing the corresponding spot size in the target region. Additional requirements are the following: (i) use of a setup characterized by a sufficiently long exit arm, while maintaining a compact size, in order to accommodate different experimental devices in the target region; (ii) generation of two XUV pulse replica, with adjustable temporal delay (accuracy of the order of 10 as).File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
