With the aim of tuning the optical properties of SiC selective solar absorbers, we investigate the surface micro/nano-texturing of porous silicon carbide by using two approaches, namely i) the femtosecond laser treatment and ii) the fluorine based reactive ion etching. It is found that both the techniques are capable of inducing significant surface morphology modification inducing a substantial roughening. The surface features produced are found to be tunable by tailoring the main process parameters, i.e. translation speed and pulse repetition rate for laser treatment, and RF-power, gas pressure and gas mixture for the reactive ion etching process.

Femtosecond laser and reactive ion etching based treatments for nanoscale surface texturing of porous silicon carbide

A Notargiacomo;M Pea;A Bellucci;M Girolami;S Orlando;DM Trucchi
2018

Abstract

With the aim of tuning the optical properties of SiC selective solar absorbers, we investigate the surface micro/nano-texturing of porous silicon carbide by using two approaches, namely i) the femtosecond laser treatment and ii) the fluorine based reactive ion etching. It is found that both the techniques are capable of inducing significant surface morphology modification inducing a substantial roughening. The surface features produced are found to be tunable by tailoring the main process parameters, i.e. translation speed and pulse repetition rate for laser treatment, and RF-power, gas pressure and gas mixture for the reactive ion etching process.
2018
Istituto di fotonica e nanotecnologie - IFN
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
978-1-5386-5336-4
femtosecond laser
reactive ion etching
silicon carbide
solar absorbers
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/356245
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