We propose two types of transistors based on lateral heterostructures of metallic and semiconducting phases of monolayer MoS2, whose top-down patterning has been recently demonstrated via electron beam irradiation [1]. The proposed transistors a MoS2 lateral heterostructure FET, and a "planar barristor", a gate Schottky diode that is the full 2D counterpart of the graphene barristor device proposed in [2]. We evaluate their performance with ab-initio simulations using as a benchmark the CMOS technology roadmap.

Two-dimensional transistors based on MoS2 lateral heterostructures

Fortunelli Alessandro;
2016

Abstract

We propose two types of transistors based on lateral heterostructures of metallic and semiconducting phases of monolayer MoS2, whose top-down patterning has been recently demonstrated via electron beam irradiation [1]. The proposed transistors a MoS2 lateral heterostructure FET, and a "planar barristor", a gate Schottky diode that is the full 2D counterpart of the graphene barristor device proposed in [2]. We evaluate their performance with ab-initio simulations using as a benchmark the CMOS technology roadmap.
2016
Istituto di Chimica dei Composti OrganoMetallici - ICCOM -
9781509039012
2D materials
transistors
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/359156
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