Potential of O(2) remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O(2) remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er(2)O(3) and ZnO films. Furthermore, post-growth room-temperature remote O(2) plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO. lms
Role of plasma activation in tailoring the nanostructure of multifunctional oxides thin films
MM Giangregorio;M Losurdo;P Capezzuto;G Bruno
2009
Abstract
Potential of O(2) remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O(2) remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er(2)O(3) and ZnO films. Furthermore, post-growth room-temperature remote O(2) plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO. lmsFile in questo prodotto:
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