The objective of the present work is to develop nanostructured surfaces by combining low pressure plasma process and colloidal lithography, with the aim of obtaining suitable substrates with predetermined ordered nanometric surface roughness and surface chemical composition. The chemical properties of the resulting nanostructures were characterized by means of X-ray photoelectron spectroscopy (XPS) and water contact angle (WCA) measurements, their morphology was characterized by scanning electron microscopy (SEM). The effects of both chemistry and morphology on Saos-2 osteoblast cell behavior was investigated.
Plasma Processes Combined with Colloidal Lithography to Produce Nanostructured Surfaces for Cell-Adhesion
Roberto Gristina;Eloisa Sardella;Pietro Favia;Riccardo d'Agostino
2009
Abstract
The objective of the present work is to develop nanostructured surfaces by combining low pressure plasma process and colloidal lithography, with the aim of obtaining suitable substrates with predetermined ordered nanometric surface roughness and surface chemical composition. The chemical properties of the resulting nanostructures were characterized by means of X-ray photoelectron spectroscopy (XPS) and water contact angle (WCA) measurements, their morphology was characterized by scanning electron microscopy (SEM). The effects of both chemistry and morphology on Saos-2 osteoblast cell behavior was investigated.File in questo prodotto:
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