Iron oxide thin films for photoelectrochemical (PEC) water splitting were deposited by radiofrequency sputtering of an iron target in argon/oxygen plasma mixtures, followed by thermal annealing. The chemical composition and structure of deposited film can be tuned by controlling the gas feed composition and the annealing temperature. The thermal treatment extensively improves the PEC water splitting performances of the films deposited at the lowest O percentages (0-1%), allowing to obtain photocurrent densities up to 1.20 mA/cm at 1.23 V. Increasing the oxygen percentage in the plasma feed allows the direct growth of photoactive films; the best result is found for the hematite film produced at 50% O, characterized by a photocurrent density of 0.21 at 1.23 V.
Plasma-assisted deposition of iron oxide thin films for photoelectrochemical water splitting
Fanelli Fiorenza;Giannuzzi Roberto;Maiorano Vincenzo;Fracassi Francesco
2021
Abstract
Iron oxide thin films for photoelectrochemical (PEC) water splitting were deposited by radiofrequency sputtering of an iron target in argon/oxygen plasma mixtures, followed by thermal annealing. The chemical composition and structure of deposited film can be tuned by controlling the gas feed composition and the annealing temperature. The thermal treatment extensively improves the PEC water splitting performances of the films deposited at the lowest O percentages (0-1%), allowing to obtain photocurrent densities up to 1.20 mA/cm at 1.23 V. Increasing the oxygen percentage in the plasma feed allows the direct growth of photoactive films; the best result is found for the hematite film produced at 50% O, characterized by a photocurrent density of 0.21 at 1.23 V.| File | Dimensione | Formato | |
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Plasma Processes Polymers - 2020 - Bosso - Plasma‐assisted deposition of iron oxide thin films for photoelectrochemical.pdf
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PPP_2020_author accepted manuscript.pdf
Open Access dal 12/08/2021
Descrizione: "This is the peer reviewed version of the following article: Bosso P, Milella A, Barucca G, et al. Plasma-assisted deposition of iron oxide thin films for photoelectrochemical water splitting. Plasma Process Polym. 2021; 18:2000121, which has been published in final form at https://doi.org/10.1002/ppap.202000121. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. This article may not be enhanced, enriched or otherwise transformed into a derivative work, without express permission from Wiley or by statutory rights under applicable legislation. Copyright notices must not be removed, obscured or modified. The article must be linked to Wiley’s version of record on Wiley Online Library and any embedding, framing or otherwise making available the article or pages thereof by third parties from platforms, services and websites other than Wiley Online Library must be prohibited."
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