AlTiN thin film deposition process was carried out via reactive Physical Vapor Deposition High-Power Impulse Magnetron Sputtering (PVD HiPI MS) with the aim of highlighting the criticalities which can occur during the coating Ti6Al4V parts realized via Selective Laser Melting (SLM). The conditions of PVD HiPIMS deposition process were adjusted in order to optimize the matching between the polished metallic substrates and the ceramic coatings. The effect of vacuum annealing at 950 degrees C onto the coated sample features was also evaluated. X-ray Diffraction, Energy Dispersive Spectroscopy associated to Field Emission Scanning Electron Microscopy (FE-SEM), profilometry, and nanoindentation were employed for carrying out a complete characterization of the film/substrate system.
AlTiN Coating of Ti6Al4V Alloy Additive Manufactured Parts
Battiston S;Montagner F;Biffi CA;
2020
Abstract
AlTiN thin film deposition process was carried out via reactive Physical Vapor Deposition High-Power Impulse Magnetron Sputtering (PVD HiPI MS) with the aim of highlighting the criticalities which can occur during the coating Ti6Al4V parts realized via Selective Laser Melting (SLM). The conditions of PVD HiPIMS deposition process were adjusted in order to optimize the matching between the polished metallic substrates and the ceramic coatings. The effect of vacuum annealing at 950 degrees C onto the coated sample features was also evaluated. X-ray Diffraction, Energy Dispersive Spectroscopy associated to Field Emission Scanning Electron Microscopy (FE-SEM), profilometry, and nanoindentation were employed for carrying out a complete characterization of the film/substrate system.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
