The initial phases of the oxidation of the GaP(1 1 0) cleaved surface have been studied, by photoemission with synchrotron radiation. A first stage in which an increase in band bending occurs and a second stage in which complete saturation of dangling bonds occurs are distinguished. This result accounts for previous surface reflectance data on the same surface. The processes of band bending variation and dangling bond saturation with oxygen exposure are very similar in GaP(1 1 0) and GaAs(1 1 0).

Initial stages of GaP(1 1 0) oxidation

1988

Abstract

The initial phases of the oxidation of the GaP(1 1 0) cleaved surface have been studied, by photoemission with synchrotron radiation. A first stage in which an increase in band bending occurs and a second stage in which complete saturation of dangling bonds occurs are distinguished. This result accounts for previous surface reflectance data on the same surface. The processes of band bending variation and dangling bond saturation with oxygen exposure are very similar in GaP(1 1 0) and GaAs(1 1 0).
1988
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
Band Bending
III-V Semiconductors
Oxygen Exposure
Photoemission
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/380623
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