In this paper, results are reported on the characterization of thin films of titanium dioxide and chalcogenide glass doped with praseodymium by the technique of plasma-assisted pulsed laser deposition (PA-PLD) with biased substrate. this technique is shown to be able to prevent contamination od deposited films by particles ejected and to improve the pulsed laser deposition process for stoichiometry, morphology and optical properties of the thin films produced.

Plasma-assisted pulsed laser deposition for the improvement of the film growth process

Senesi GS;
2002

Abstract

In this paper, results are reported on the characterization of thin films of titanium dioxide and chalcogenide glass doped with praseodymium by the technique of plasma-assisted pulsed laser deposition (PA-PLD) with biased substrate. this technique is shown to be able to prevent contamination od deposited films by particles ejected and to improve the pulsed laser deposition process for stoichiometry, morphology and optical properties of the thin films produced.
2002
Istituto di Nanotecnologia - NANOTEC
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/38223
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