This paper deals with the quadrupole mass spectrometric evaluation of fluoro-compd. emissions during plasma processing. A crit. discussion of the anal. procedure including the estn. of quantification limits, detection limits, and t-Student test, is reported. The use of pos. and neg. chem. ionization as the ionization source to reduce the interference due to peak overlapping is also examd.

On the use and limits of mass spectrometry for the characterization of fluorocarbon emission during plasma processing

Fracassi F;D'Agostino R;
2002

Abstract

This paper deals with the quadrupole mass spectrometric evaluation of fluoro-compd. emissions during plasma processing. A crit. discussion of the anal. procedure including the estn. of quantification limits, detection limits, and t-Student test, is reported. The use of pos. and neg. chem. ionization as the ionization source to reduce the interference due to peak overlapping is also examd.
2002
Istituto di Nanotecnologia - NANOTEC
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/38242
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