Optical elements working at 121.6nm make use of Al and MgF2. We analyzed mono- and bi-layers of these materials, deposited by e-beam evaporation, and discussed how substrate temperatures and annealing affect their performances.

Efficiency of VUV Optical Materials According to Variations in Deposition Conditions

A J Corso;P Zuppella;M G Pelizzo
2015

Abstract

Optical elements working at 121.6nm make use of Al and MgF2. We analyzed mono- and bi-layers of these materials, deposited by e-beam evaporation, and discussed how substrate temperatures and annealing affect their performances.
2015
Thin film
optical constant
ultraviolet
space
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/384262
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