In this work. we investigate in details the air/film and film/substrate interface morphology of single Hf02, SiO, and ZrOz films by means of X-ray reflectivity and atomic force microscopy measurements. The films were deposited on silicon substrate by dual ion beam sputtering technique. The roughness obtained from the X-ray scattering experiments were compared with the atomic force microscopy data. 0 1998 Published by Elsevier Science S.A.
Surface and interface morphology of thin oxide films investigated by X-ray reflectivity and atomic force microscopy
G Leo;
1998
Abstract
In this work. we investigate in details the air/film and film/substrate interface morphology of single Hf02, SiO, and ZrOz films by means of X-ray reflectivity and atomic force microscopy measurements. The films were deposited on silicon substrate by dual ion beam sputtering technique. The roughness obtained from the X-ray scattering experiments were compared with the atomic force microscopy data. 0 1998 Published by Elsevier Science S.A.File in questo prodotto:
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