We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz-200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than approximate to 10 kHz.
Plume shielding effects in ultrafast laser surface texturing of silicon at high repetition rate in air
Allahyari E;Fittipaldi R;Vecchione A;Parlato L;Bruzzese R;Amoruso S
2019
Abstract
We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz-200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than approximate to 10 kHz.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
