We performed a combined secondary electron yield and X-ray photoelectron spectroscopy study on a prototypical system formed by increasing coverages of amorphous carbon (a-C) deposited on atomically clean Cu. A remarkably thin a-C layer, of about 6-8 nm, is surprisingly enough to lower below 1 the secondary emission yield of the whole system. This feature qualifies such low thickness coatings as a optimal multipacting suppressor that will not significantly affect impedance issues. The concomitant reduction of surface conductivity observed after antimultipacting coating is, in fact, a major drawback, reducing its applicability in many research fields. The consequences of this observation are discussed mainly for a-C coating applications to mitigate detrimental multipacting effects in radio-frequency devices and accelerators, but are expected to be of interest for other research fields and to hold for other conductive substrates and overlayers.

Minimum thickness of carbon coating for multipacting suppression

Larciprete R.;
2020

Abstract

We performed a combined secondary electron yield and X-ray photoelectron spectroscopy study on a prototypical system formed by increasing coverages of amorphous carbon (a-C) deposited on atomically clean Cu. A remarkably thin a-C layer, of about 6-8 nm, is surprisingly enough to lower below 1 the secondary emission yield of the whole system. This feature qualifies such low thickness coatings as a optimal multipacting suppressor that will not significantly affect impedance issues. The concomitant reduction of surface conductivity observed after antimultipacting coating is, in fact, a major drawback, reducing its applicability in many research fields. The consequences of this observation are discussed mainly for a-C coating applications to mitigate detrimental multipacting effects in radio-frequency devices and accelerators, but are expected to be of interest for other research fields and to hold for other conductive substrates and overlayers.
2020
Istituto dei Sistemi Complessi - ISC
Amorphous carbon; Copper metallography; Secondary emission; X ray photoelectron spectroscopy
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/395673
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