High level active n(+) doping of strained germanium through co-implantation and nanosecond pulsed laser melting

Obtaining high level active nþ carrier concentrations in germanium (Ge) has been a significant challenge for further development of Ge devices. By ion implanting phosphorus (P) and fluorine (F) into Ge and restoring crystallinity using Nd:YAG nanosecond pulsed laser melting (PLM), we demonstrate 1020 cm"3 nþ carrier concentration in tensile-strained epitaxial germanium-on-silicon. Scanning electron microscopy shows that after laser treatment, samples implanted with P have an ablated surface, whereas PþF co-implanted samples have good crystallinity and a smooth surface topography. We characterize P and F concentration depth profiles using secondary ion mass spec- trometry and spreading resistance profiling. The peak carrier concentration, 1020 cm"3 at 80nm below the surface, coincides with the peak F concentration, illustrating the key role of F in increas- ing donor activation. Cross-sectional transmission electron microscopy of the co-implanted sample shows that the Ge epilayer region damaged during implantation is a single crystal after PLM. High- resolution X-ray diffraction and Raman spectroscopy measurements both indicate that the as- grown epitaxial layer strain is preserved after PLM. These results demonstrate that co-implantation and PLM can achieve the combination of nþ carrier concentration and strain in Ge epilayers neces- sary for next-generation, high-performance Ge-on-Si devices.

Obtaining high level active n(+) carrier concentrations in germanium (Ge) has been a significant challenge for further development of Ge devices. By ion implanting phosphorus (P) and fluorine (F) into Ge and restoring crystallinity using Nd: YAG nanosecond pulsed laser melting (PLM), we demonstrate 10(20) cm(-3) n(+) carrier concentration in tensile-strained epitaxial germanium-on-silicon. Scanning electron microscopy shows that after laser treatment, samples implanted with P have an ablated surface, whereas P+F co-implanted samples have good crystallinity and a smooth surface topography. We characterize P and F concentration depth profiles using secondary ion mass spectrometry and spreading resistance profiling. The peak carrier concentration, 10(20) cm(-3) at 80 nm below the surface, coincides with the peak F concentration, illustrating the key role of F in increasing donor activation. Cross-sectional transmission electron microscopy of the co-implanted sample shows that the Ge epilayer region damaged during implantation is a single crystal after PLM. High-resolution X-ray diffraction and Raman spectroscopy measurements both indicate that the as-grown epitaxial layer strain is preserved after PLM. These results demonstrate that co-implantation and PLM can achieve the combination of n(+) carrier concentration and strain in Ge epilayers necessary for next-generation, high-performance Ge-on-Si devices. Published by AIP Publishing.