The possibility to locally incorporate/remove hydrogen atoms in/from dilute-nitride semiconductors is demonstrated. This method can be applied to the fabrication of site-controlled single-photon emitters but also to the optimization/fabrication of photonic devices, via refractive-index engineering. ? OSA 2019 ? 2019 The Author(s)
Spatially selective hydrogen irradiation/removal of dilute nitrides: A versatile nanofabrication tool for photonic applications
Pettinari G;Rubini S;Gerardino A;
2019
Abstract
The possibility to locally incorporate/remove hydrogen atoms in/from dilute-nitride semiconductors is demonstrated. This method can be applied to the fabrication of site-controlled single-photon emitters but also to the optimization/fabrication of photonic devices, via refractive-index engineering. ? OSA 2019 ? 2019 The Author(s)File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
