In this paper we present a theoretical investigation of the InN nonpolar surface functionalization and propose a grafting mechanism for different functional groups. Ab initio calculations were first applied to explore the electronic properties of clean surfaces; afterward, they were employed to address InN nonpolar surface functionalization. InN surfaces were found to be highly reactive upon exposure to the most common functional groups: methanethiol (CH3−SH), acetic acid (CH3−COOH), methylamine (CH3−NH2), and methanol (CH3−OH). They all strongly bind to the surface with exothermic reaction.

First-Principles Investigations of InN Nonpolar Surface Functionalization

2009

Abstract

In this paper we present a theoretical investigation of the InN nonpolar surface functionalization and propose a grafting mechanism for different functional groups. Ab initio calculations were first applied to explore the electronic properties of clean surfaces; afterward, they were employed to address InN nonpolar surface functionalization. InN surfaces were found to be highly reactive upon exposure to the most common functional groups: methanethiol (CH3−SH), acetic acid (CH3−COOH), methylamine (CH3−NH2), and methanol (CH3−OH). They all strongly bind to the surface with exothermic reaction.
2009
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Electronic states
Adsorption
Nitrides
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/41093
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