We herein address the problem of polymorph selection by introducing a general and straightforward concept based on their ordering. We demonstrated the concept by the ordered patterning of four compounds capable of forming different polymorphs when deposited on technologically relevant surfaces. Our approach exploits the fact that, when the growth of a crystalline material is confined within sufficiently small cavities, only one of the possible polymorphs is generated. We verify our method by utilizing several model compounds to fabricate micrometric "logic patterns" in which each of the printed pixels is easily identifiable as comprising only one polymorph and can be individually accessed for further operations.

Polymorph Separation by Ordered Patterning

Cavallini Massimiliano;Brucale Marco;Gentili Denis;Liscio Fabiola;Favaretto Laura;Manet Ilse;Zambianchi Massimo;Melucci Manuela
2022

Abstract

We herein address the problem of polymorph selection by introducing a general and straightforward concept based on their ordering. We demonstrated the concept by the ordered patterning of four compounds capable of forming different polymorphs when deposited on technologically relevant surfaces. Our approach exploits the fact that, when the growth of a crystalline material is confined within sufficiently small cavities, only one of the possible polymorphs is generated. We verify our method by utilizing several model compounds to fabricate micrometric "logic patterns" in which each of the printed pixels is easily identifiable as comprising only one polymorph and can be individually accessed for further operations.
2022
Istituto per la Sintesi Organica e la Fotoreattivita' - ISOF
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
Istituto per la Microelettronica e Microsistemi - IMM
polymorphism
patterning
polymorph control
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/416505
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