Surface reflection topographs of heteroepitaxial ZnSe films on GaAs substrates were obtained using grazing incident synchrotron X-ray radiation. The topographs indicated that diffraction occurred only in the ZnSe epilayer because no misfit dislocations within the interface were visible. Furthermore, the lattice perfection of the ZnSe epilayer was lower than that of the GaAs substrate, although strain relaxation arose due to the nucleation of misfit dislocations.

Grazing incident X-ray topographs of heteroepitaxial ZnSe films on GaAs substrates

Prete P;
2004

Abstract

Surface reflection topographs of heteroepitaxial ZnSe films on GaAs substrates were obtained using grazing incident synchrotron X-ray radiation. The topographs indicated that diffraction occurred only in the ZnSe epilayer because no misfit dislocations within the interface were visible. Furthermore, the lattice perfection of the ZnSe epilayer was lower than that of the GaAs substrate, although strain relaxation arose due to the nucleation of misfit dislocations.
2004
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
43
321
323
3
Sì, ma tipo non specificato
ZnSe/GaAs; heteroepitaxial semiconductor; topography; grazing incident
5
info:eu-repo/semantics/article
262
Mizuno, K; Fujiki, F; Okamoto, H; Prete, P; Lovergine, N
01 Contributo su Rivista::01.01 Articolo in rivista
none
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/41713
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 2
  • ???jsp.display-item.citation.isi??? 2
social impact