Understanding howa spin current flows across metal-semiconductor interfaces at pico- and femtosecond time scales is of paramount importance for ultrafast spintronics, data processing, and storage applications. However, the possibility to directly access the propagation of spin currents, within such time scales, has been hampered by the simultaneous lack of both ultrafast element-specific magnetic sensitive probes and tailoredwell-built and characterized metal-semiconductor interfaces. Here, by means of a novel free-electron laser-based element-sensitive ultrafast time-resolved Kerr spectroscopy, we reveal different magnetodynamics for the Ni M2;3 and Si L2;3 absorption edges. These results are assumed to be the experimental evidence of photoinduced spin currents propagating at a speed of 0.2 nm/fs across the Ni/Si interface.

All-optical spin injection in silicon investigated by element-specific time-resolved Kerr effect

Roberto Flammini;Paolo Moras;Matteo Jugovac;Piu Rajak;Mahabul Islam;Regina Ciancio;Marco Zangrando;
2022

Abstract

Understanding howa spin current flows across metal-semiconductor interfaces at pico- and femtosecond time scales is of paramount importance for ultrafast spintronics, data processing, and storage applications. However, the possibility to directly access the propagation of spin currents, within such time scales, has been hampered by the simultaneous lack of both ultrafast element-specific magnetic sensitive probes and tailoredwell-built and characterized metal-semiconductor interfaces. Here, by means of a novel free-electron laser-based element-sensitive ultrafast time-resolved Kerr spectroscopy, we reveal different magnetodynamics for the Ni M2;3 and Si L2;3 absorption edges. These results are assumed to be the experimental evidence of photoinduced spin currents propagating at a speed of 0.2 nm/fs across the Ni/Si interface.
2022
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
Istituto Officina dei Materiali - IOM -
spin-injection
metal-semiconductor interface
ultrafast
free electron laser
Kerr effect
time resolved
silicon nitride
nickel
silicon
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/417281
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