Low temperature sputtered ITO on glass and epoxy resin substrates: influence of process parameters and substrate roughness on morphological and electrical properties

Tin doped indium oxide (ITO) coatings have been deposited on epoxy resin and glass substrates by low temperature (70 degrees C) RF magnetron sputtering. Influence of different process parameters on coating morphological and electrical properties has been studied. Epoxy resin surface roughness influence on coating microstructure was also investigated. We have found that (i) deposition chamber oxygen content is the main parameter affecting surface electrical resistance, (ii) microstructure and electrical properties are similar in both glass and polymeric smooth substrates; in the latter the substrate stability (type of polymer and degree of cure) is important to prevent microcracks formation as a result of stress release after deposition, and (iii) rough substrates present a non-uniform microstructures with formation of clusters of crystallites with various orientation.