Third-generation TiO photocatalysts were prepared by implantation of C ions into 110nm thick TiO films. An accurate structural investigation was performed by Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, Raman-luminescence spectroscopy, and UV/VIS optical characterization. The C doping locally modified the TiO pure films, lowering the band-gap energy from 3.3eV to a value of 1.8eV, making the material sensitive to visible light. The synthesized materials are photocatalytically active in the degradation of organic compounds in water under both UV and visible light irradiation, without the help of any additional thermal treatment. These results increase the understanding of the C-doped titanium dioxide, helpful for future environmental applications.
C ion-implanted TiO2 thin film for photocatalytic applications
Impellizzeri G;Scuderi V;Romano L;Napolitani E;Privitera V
2015
Abstract
Third-generation TiO photocatalysts were prepared by implantation of C ions into 110nm thick TiO films. An accurate structural investigation was performed by Rutherford backscattering spectrometry, secondary ion mass spectrometry, X-ray diffraction, Raman-luminescence spectroscopy, and UV/VIS optical characterization. The C doping locally modified the TiO pure films, lowering the band-gap energy from 3.3eV to a value of 1.8eV, making the material sensitive to visible light. The synthesized materials are photocatalytically active in the degradation of organic compounds in water under both UV and visible light irradiation, without the help of any additional thermal treatment. These results increase the understanding of the C-doped titanium dioxide, helpful for future environmental applications.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
