The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal-organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation

Perrotta Alberto;
2016

Abstract

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal-organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
2016
Inglese
28
34
7479
7485
http://www.scopus.com/record/display.url?eid=2-s2.0-84985994923&origin=inward
Sì, ma tipo non specificato
free-radical polymerization
gas separation
iPECVD
metalloporphyrins
metal-organic covalent networks
6
info:eu-repo/semantics/article
262
Boscher Nicolas, D; Wang, Minghui; Perrotta, Alberto; Heinze, Katja; Creatore, Mariadriana; Gleason Karen, K
01 Contributo su Rivista::01.01 Articolo in rivista
none
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/425719
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