Deposition of thin films containing carboxylic acid groups on polyurethane foams by atmospheric pressure non-equilibrium plasma jet

The arrangement of the plasma jet, the sample holder, and the substrate is carefully optimized to enable the penetration of the plasma ejected from the remote source throughout the three-dimensional (3D) porous structure of the foam, and, therefore, to achieve the uniform coverage of the entire substrate.

Thin films containing carboxylic acid groups are deposited on open-cell polyurethane (PU) foams by using an atmospheric pressure non-equilibrium plasma jet, in dielectric barrier discharge configuration, fed with helium, acrylic acid and ethylene.