Hexagonal mesoporous silica (HMS) is functionalised with mercaptopropyl groups by adopting two different pro-cedures; co-condensation and grafting. In both cases tetra-ethylorthosilicate (TEOS) and 3-mercaptopropyltriethoxysil-ane (3-MPTES) are used as the silicon and sulfur precursors, respectively. The obtained materials are analysed by several techniques such as N2sorption, TG-DTA, XRD, SAXS and-solid state 29Si {1H} CP-MAS NMR spectroscopy. By taking advantage of the chemical interaction between gold and the -SH groups, the effect of the thiol addition procedure on the supporting capability of the functionalised silica is evalu-ated by depositing gold through the incipient wet impregna-tion technique. The influence of the functionalisation method on the electronic structure of gold and on its surface distribu-tion is determined by extended X-ray fine absorption spectra (EXAFS) of Au at the LIII edge and by X-ray photoelectron spectroscopy (XPS).

Interaction of gold with co-condensed and grafted HMS-SH silica: study by 29Si(1H) CP-MAS-NMR,XRD,XPS and Au LIII EXAFS

V La Parola;A Longo;
2010

Abstract

Hexagonal mesoporous silica (HMS) is functionalised with mercaptopropyl groups by adopting two different pro-cedures; co-condensation and grafting. In both cases tetra-ethylorthosilicate (TEOS) and 3-mercaptopropyltriethoxysil-ane (3-MPTES) are used as the silicon and sulfur precursors, respectively. The obtained materials are analysed by several techniques such as N2sorption, TG-DTA, XRD, SAXS and-solid state 29Si {1H} CP-MAS NMR spectroscopy. By taking advantage of the chemical interaction between gold and the -SH groups, the effect of the thiol addition procedure on the supporting capability of the functionalised silica is evalu-ated by depositing gold through the incipient wet impregna-tion technique. The influence of the functionalisation method on the electronic structure of gold and on its surface distribu-tion is determined by extended X-ray fine absorption spectra (EXAFS) of Au at the LIII edge and by X-ray photoelectron spectroscopy (XPS).
2010
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/432234
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