In this work we investigate the influence of the substrate resistivity and of different buffer layers on the out-of-band insertion losses in AIN SAW devices fabricated on (100) silicon substrates. The measurements have shown that the out-of-band insertion loss is improved by increasing the substrate resistivity but also by the introduction of an insulating buffer layer material. An out-of-band insertion loss as low as -75 dB has been achieved by the device realized on a silicon nitride buffer layer. This can be explained in terms of inhibition of the diffusion of silicon atoms in the AIN film. Our results show that silicon nitride represents a good solution in terms of low out-of-band insertion loss and cost effectiveness for the realization of nitride-based piezoelectric MEMS devices on silicon substrates. (c) 2007 Elsevier B.V. All rights reserved.

Fabrication of AlN/Si SAW delay lines with very low RF signal noise

Altamura D;De Vittorio M;Passaseo A
2007

Abstract

In this work we investigate the influence of the substrate resistivity and of different buffer layers on the out-of-band insertion losses in AIN SAW devices fabricated on (100) silicon substrates. The measurements have shown that the out-of-band insertion loss is improved by increasing the substrate resistivity but also by the introduction of an insulating buffer layer material. An out-of-band insertion loss as low as -75 dB has been achieved by the device realized on a silicon nitride buffer layer. This can be explained in terms of inhibition of the diffusion of silicon atoms in the AIN film. Our results show that silicon nitride represents a good solution in terms of low out-of-band insertion loss and cost effectiveness for the realization of nitride-based piezoelectric MEMS devices on silicon substrates. (c) 2007 Elsevier B.V. All rights reserved.
2007
Istituto di Nanotecnologia - NANOTEC
INFM
Insertion loss
FILMS
SAW
AlN
Piezo
Sputtering
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/456407
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact