We have investigated in detail the capability of a CAMECA IMS-4f magnetic-sector SIMS instrument in terms of ultimate depth resolution; accuracy, quantification in the uppermost layers, sensitivity and dynamic range, as well as fastness and ease of measurement. A method to obtain ultrahigh depth resolutions will be demonstrated and discussed. The study has primarily been finalized to the investigation of ultrashallow boron implants in silicon. Specific applications to the above-mentioned material will be presented. In particular, it will be shown that, taking advantage of the developed measurement protocol, it was possible to perform a detailed investigation on the atomic transport properties of the sub-keV energy implanted boron in silicon.

Ultrashallow profiling of semiconductors by secondary ion mass spectrometry: methods and applications

Napolitani E;Privitera V;
2001

Abstract

We have investigated in detail the capability of a CAMECA IMS-4f magnetic-sector SIMS instrument in terms of ultimate depth resolution; accuracy, quantification in the uppermost layers, sensitivity and dynamic range, as well as fastness and ease of measurement. A method to obtain ultrahigh depth resolutions will be demonstrated and discussed. The study has primarily been finalized to the investigation of ultrashallow boron implants in silicon. Specific applications to the above-mentioned material will be presented. In particular, it will be shown that, taking advantage of the developed measurement protocol, it was possible to perform a detailed investigation on the atomic transport properties of the sub-keV energy implanted boron in silicon.
2001
Istituto per la Microelettronica e Microsistemi - IMM
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/46383
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 9
social impact