Si3N4 - composite materials containing different amounts of MoSi2 were produced by hot pressing. MoSi2 particles (mean size 0.8 μm) were homogeneously dispersed within a nanostructured Si3N4 matrix (mean grain size < 0.2 μm). The influence of MoSi2 inclusions on microstructure and electrical and mechanical properties of the composites is discussed. As a result of both the refined microstructure of the matrix and presence of ductile inclusions, these materials possess good mechanical properties, with a bending strength up to 1130 MPa (RT) and 880 MPa (1000°C) and a fracture toughness up to 6 MPa·m1/2. Electrical resistivity drops to ∼10-3 Ω·cm.
Properties of Si3N4 - MOSi2 composites with a nanostructured matrix
Sciti D.;Guicciardi o Guizzardi S.;Bellosi A.
2002
Abstract
Si3N4 - composite materials containing different amounts of MoSi2 were produced by hot pressing. MoSi2 particles (mean size 0.8 μm) were homogeneously dispersed within a nanostructured Si3N4 matrix (mean grain size < 0.2 μm). The influence of MoSi2 inclusions on microstructure and electrical and mechanical properties of the composites is discussed. As a result of both the refined microstructure of the matrix and presence of ductile inclusions, these materials possess good mechanical properties, with a bending strength up to 1130 MPa (RT) and 880 MPa (1000°C) and a fracture toughness up to 6 MPa·m1/2. Electrical resistivity drops to ∼10-3 Ω·cm.| File | Dimensione | Formato | |
|---|---|---|---|
|
Si3N4_MoSi2_JCeramProcRes_2002.pdf
solo utenti autorizzati
Tipologia:
Versione Editoriale (PDF)
Licenza:
NON PUBBLICO - Accesso privato/ristretto
Dimensione
1.35 MB
Formato
Adobe PDF
|
1.35 MB | Adobe PDF | Visualizza/Apri Richiedi una copia |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
