The search of microbial control strategies is a current challenge to fight emerging infection in the treatment of surgical and traumatic wounds, by overcoming multidrug resistance (MDR). One of the approaches points to the design of “smart” nanoassemblies entrapping photosensitisers (PS) for antimicrobial photodynamic therapy (aPDT). Due to partial photostability of free PS, the design of novel delivery systems are highly required to decrease PS photodegradation, thus improving the therapeutic efficacy. Within our ongoing research on nanophotosensitisers (NanoPS) [1, 2], here we will discuss novel nanohydrogels incorporating cyclodextrin/PS constructs to control wound infections. In particular nanocomplexes of cationic porphyrin (N-methyl- 4-pyridyl)- 21H,23H-porphyrin (TMPyP)) assembled with the trade sulfobutylether-β-cyclodextrin (CAPTISOL®) were entrapped in fast-resorbable hydrogel named DAC®. The polymer is composed of hyaluronic acid grafted with poly-lactic acid (HA-PLA) and has already proved to prevent biofilm formation in vitro and in vivo, and to prevent the onset of periprosthetic joint infection (PJI) in a large number of patients. Rheology and erosion release studies were carried out on DAC® based photo-antimicrobial. Upon dilution, nanohydrogels which represent the erosion products for the local application on infected wound were characterized by UV/Vis absorption, steadystate and time-resolved fluorescence emission and DLS technique. Nanohydrogels exhibited photo-bactericidal activity against Gram-positive and Gram-negative bacteria, such as methicillin-resistant Staphylococcus aureus (MRSA) ATCC 43300, vancomycin-resistant Enterococcus faecium (VREfm) DSM 17050 and VIM-2 producing Pseudomonas aeruginosa DSM102273. Altogether in vitro photo-antimicrobial studies elucidated the aPDT efficacy of our photosensitizing nanohydrogels incorporating cyclodextrin/PS constructs.

Cyclodextrin/Photosensitiser Supramolecular Constructs: A Short Journey From Nanoassemblies to Hydrogels with Photoantimicrobial Response

Nina Burduja;Mariachiara Trapani;Giuseppe Nocito;Antonino Mazzaglia
2024

Abstract

The search of microbial control strategies is a current challenge to fight emerging infection in the treatment of surgical and traumatic wounds, by overcoming multidrug resistance (MDR). One of the approaches points to the design of “smart” nanoassemblies entrapping photosensitisers (PS) for antimicrobial photodynamic therapy (aPDT). Due to partial photostability of free PS, the design of novel delivery systems are highly required to decrease PS photodegradation, thus improving the therapeutic efficacy. Within our ongoing research on nanophotosensitisers (NanoPS) [1, 2], here we will discuss novel nanohydrogels incorporating cyclodextrin/PS constructs to control wound infections. In particular nanocomplexes of cationic porphyrin (N-methyl- 4-pyridyl)- 21H,23H-porphyrin (TMPyP)) assembled with the trade sulfobutylether-β-cyclodextrin (CAPTISOL®) were entrapped in fast-resorbable hydrogel named DAC®. The polymer is composed of hyaluronic acid grafted with poly-lactic acid (HA-PLA) and has already proved to prevent biofilm formation in vitro and in vivo, and to prevent the onset of periprosthetic joint infection (PJI) in a large number of patients. Rheology and erosion release studies were carried out on DAC® based photo-antimicrobial. Upon dilution, nanohydrogels which represent the erosion products for the local application on infected wound were characterized by UV/Vis absorption, steadystate and time-resolved fluorescence emission and DLS technique. Nanohydrogels exhibited photo-bactericidal activity against Gram-positive and Gram-negative bacteria, such as methicillin-resistant Staphylococcus aureus (MRSA) ATCC 43300, vancomycin-resistant Enterococcus faecium (VREfm) DSM 17050 and VIM-2 producing Pseudomonas aeruginosa DSM102273. Altogether in vitro photo-antimicrobial studies elucidated the aPDT efficacy of our photosensitizing nanohydrogels incorporating cyclodextrin/PS constructs.
2024
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/480901
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