Thin films of Ba(Ti1-xSnx)O3 with x = 0.13 have been deposited by rf-magnetron sputtering and their growth morphology and structure vs. annealing temperature, in oxygen atmosphere, have been investigated. The films deposited on silicon-platinum substrates, at room temperature, in Ar atmosphere were amorphous. The as-obtained films had a mean surface roughness (RMS) around 6.529 nm and a grain size of about 150 nm. By annealing the film up to 1150°C in oxygen, the grains size increases up to 1-1.5 ¼m in diameter. Films containing BaTi0.87Sn0.13 as crystalline phase with the cubic structure of BaTiO3 and, bundle-like morphology were obtained by heating the film at 1250°C for 3h in oxygen. The as-obtained film showed the preferential (110) and (100) orientations

Evolution of the surface morphology with temperature, in oxidant atmosphere, of Ba (Ti1-xSnx)O3 (x = 0.13) thin films

Galassi C
2009

Abstract

Thin films of Ba(Ti1-xSnx)O3 with x = 0.13 have been deposited by rf-magnetron sputtering and their growth morphology and structure vs. annealing temperature, in oxygen atmosphere, have been investigated. The films deposited on silicon-platinum substrates, at room temperature, in Ar atmosphere were amorphous. The as-obtained films had a mean surface roughness (RMS) around 6.529 nm and a grain size of about 150 nm. By annealing the film up to 1150°C in oxygen, the grains size increases up to 1-1.5 ¼m in diameter. Films containing BaTi0.87Sn0.13 as crystalline phase with the cubic structure of BaTiO3 and, bundle-like morphology were obtained by heating the film at 1250°C for 3h in oxygen. The as-obtained film showed the preferential (110) and (100) orientations
2009
Istituto di Scienza, Tecnologia e Sostenibilità per lo Sviluppo dei Materiali Ceramici - ISSMC (ex ISTEC)
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/48873
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