In this paper a new approach to manufacture low losses coplanar waveguide (CPW) lines for microwave and millimeter wave signal processing is presented. A photolithographic process is performed by using SU-8 thick negative photo-resist on low resistivity silicon wafers, to obtain CPW lines elevated with respect to the substrate, in order to take advantages, in terms of propagation losses, from transmission line structures which are almost on-the-air.
Low-loss microwave interconnections by using polymeric based coplanar waveguides on low resistivity silicon substrates
Marcelli R;Frenguelli L
2008
Abstract
In this paper a new approach to manufacture low losses coplanar waveguide (CPW) lines for microwave and millimeter wave signal processing is presented. A photolithographic process is performed by using SU-8 thick negative photo-resist on low resistivity silicon wafers, to obtain CPW lines elevated with respect to the substrate, in order to take advantages, in terms of propagation losses, from transmission line structures which are almost on-the-air.File in questo prodotto:
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