We report on the direct electron-beam patterning of a negative tone resist SU8-2000 for the fabrication of a two-dimensionalphotoniccrystal (2D-PC) waveguide. The high refractive index of the SU8-2000 (about 1.69), its transparency above 360 nm, the good mechanical stability and the possibility of direct patterning by electron-beam lithography, make such resist ideal for the direct realization of high-resolution photoniccrystal waveguides. The fabrication of a triangular array of sub-micron pillars (lattice constant of 300 nm and filling factor of 0.35) suitable for the realization of a 2D-PC waveguide on a glass substrate is reported. The energy dispersion diagram, calculated by the plane wave expansion technique, shows that this 2D-PC structure has a small photonic band gap (PBG) for the TM-like modes.
Two-dimensional Photonic Crystal Waveguide obtained by e-beam direct writing of SU8-2000 Photoresist
M De Vittorio;MT Todaro;T Stomeo;D Cojoc;E Di Fabrizio
2004
Abstract
We report on the direct electron-beam patterning of a negative tone resist SU8-2000 for the fabrication of a two-dimensionalphotoniccrystal (2D-PC) waveguide. The high refractive index of the SU8-2000 (about 1.69), its transparency above 360 nm, the good mechanical stability and the possibility of direct patterning by electron-beam lithography, make such resist ideal for the direct realization of high-resolution photoniccrystal waveguides. The fabrication of a triangular array of sub-micron pillars (lattice constant of 300 nm and filling factor of 0.35) suitable for the realization of a 2D-PC waveguide on a glass substrate is reported. The energy dispersion diagram, calculated by the plane wave expansion technique, shows that this 2D-PC structure has a small photonic band gap (PBG) for the TM-like modes.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
