In this work, a technique for achieving double face, sub-micron and 2-D reversed domain patterns is proposed, in congruent r-cut LN crystals. This technique is based on resist patterning the samples by interference photolithography followed by an electric field overpoling process.
Double face two-dimensional domain engineering in congruent lithium niobate
Grilli S.
Writing – Original Draft Preparation
;Sansone L.Data Curation
;Paturzo M.Formal Analysis
;De Nicola S.Methodology
;Pierattini G.Writing – Original Draft Preparation
;
2005
Abstract
In this work, a technique for achieving double face, sub-micron and 2-D reversed domain patterns is proposed, in congruent r-cut LN crystals. This technique is based on resist patterning the samples by interference photolithography followed by an electric field overpoling process.File in questo prodotto:
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