At variance with the mechanisms responsible of the passivation of typical shallow dopants in GaAs, where H bonding to the impurity or to its neighbors permits a recovery of the ``natural'' chemical valence of the impurity itself, in the case of the N isoelectronic impurity in GaAs, H induces no changes in the N chemical valence. It breaks, instead, two Ga--N bonds to form complexes sharing a common, quite stable, NH$_2$ core characterized by a local C$_{2v}$-like symmetry, thus strongly perturbing the interactions of N with its four Ga neighbors. A theoretical picture is presented here, where the N effects on the GaAs electronic properties, as well as their passivation upon hydrogenation, are closely related to the local N--Ga interactions and to the perturbations induced by H bonding on the N environment. The formation of multiple-H complexes with N, predicted by theory, is also discussed together with the support given to their existence by recent experimental findings.

Theory of hydrogen in dilute nitrides

Filippone F.
Secondo
2015

Abstract

At variance with the mechanisms responsible of the passivation of typical shallow dopants in GaAs, where H bonding to the impurity or to its neighbors permits a recovery of the ``natural'' chemical valence of the impurity itself, in the case of the N isoelectronic impurity in GaAs, H induces no changes in the N chemical valence. It breaks, instead, two Ga--N bonds to form complexes sharing a common, quite stable, NH$_2$ core characterized by a local C$_{2v}$-like symmetry, thus strongly perturbing the interactions of N with its four Ga neighbors. A theoretical picture is presented here, where the N effects on the GaAs electronic properties, as well as their passivation upon hydrogenation, are closely related to the local N--Ga interactions and to the perturbations induced by H bonding on the N environment. The formation of multiple-H complexes with N, predicted by theory, is also discussed together with the support given to their existence by recent experimental findings.
2015
Istituto di Struttura della Materia - ISM - Sede Secondaria Montelibretti
978-981-4463-45-4
DFT, Hydrogen, III-V semiconductors, defects
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/517859
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