The electrochemical atomic layer epitaxy (ECALE) methodology is a valid and low-cost approach for thin film formation on a metallic substrate. This paper reports on a morphological and photoelectrochemical investigation carried out on CdS samples formed with various numbers of deposition cycles. Ex-situ atomic force microscopy (AFM) measurements showed the attainment of a well-defined morphology, with an almost constant size and density of clusters. The layer-by-layer growth mechanism that is the aim of ECALE methodology, and that is strongly suggested by the electrochemical characterisation, seems to be confirmed. The photoresponse of the material, evaluated in alkaline polysulphide medium, shows a spectral dependence in very good agreement with literature reports for CdS single crystals.

Characterisation of thin films of CdS deposited on Ag(111) by ECALE. A morphological and photoelectrochemical investigation

Cattarin S;Cavallini M;
2002

Abstract

The electrochemical atomic layer epitaxy (ECALE) methodology is a valid and low-cost approach for thin film formation on a metallic substrate. This paper reports on a morphological and photoelectrochemical investigation carried out on CdS samples formed with various numbers of deposition cycles. Ex-situ atomic force microscopy (AFM) measurements showed the attainment of a well-defined morphology, with an almost constant size and density of clusters. The layer-by-layer growth mechanism that is the aim of ECALE methodology, and that is strongly suggested by the electrochemical characterisation, seems to be confirmed. The photoresponse of the material, evaluated in alkaline polysulphide medium, shows a spectral dependence in very good agreement with literature reports for CdS single crystals.
2002
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/52233
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 58
  • ???jsp.display-item.citation.isi??? ND
social impact