This experimental study focuses on the reversible threshold voltage shift (ΔVT) observed in SiC power MOSFETs. A positive gate bias causes a positive ΔVT, which can be fully recovered by applying a zero or a small negative voltage. This fully recoverable ΔVT behavior is ascribed to the trapping and de-trapping of electrons from the SiC layer into the pre-existing interface or oxide border traps and vice versa.

ON THE REVERSIBLE THRESHOLD VOLTAGE SHIFT IN SIC POWER MOSFETs

Giuseppe Consentino;
2019

Abstract

This experimental study focuses on the reversible threshold voltage shift (ΔVT) observed in SiC power MOSFETs. A positive gate bias causes a positive ΔVT, which can be fully recovered by applying a zero or a small negative voltage. This fully recoverable ΔVT behavior is ascribed to the trapping and de-trapping of electrons from the SiC layer into the pre-existing interface or oxide border traps and vice versa.
2019
Istituto per la Microelettronica e Microsistemi - IMM
Power MOSFETs, SiC, Simulation, Characterization
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/523382
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