NO and N2O emissions represent a worldwide problem of immense concern and, therefore, due to increasing limits imposed by stricter legislation, many efforts are devoted to their catalytic abatement. NO and N2O are also formed in industrial processes, such as nitric and adipic acid plants, where they are removed sequentially. Considering the above, it can be interesting for practical applications to find a catalyst for the simultaneous abatement of NO and N2O, taking into account that its activity could be strongly affected by the amount of O2 in the exhaust stream. While there are many laboratory studies describing the abatement of either NO or N2O, i.e. in separate experiments, there are relatively few reports of catalysts that remove both pollutants simultaneously. Here we report some results on the reduction of both NO and N2O over Pt,Pd,Rh/Al2O3-SiO2 and Pt,Pd,Rh/Al2O3-ZrO2 catalysts using CH4 as reductant in the presence of different amounts of O2.
Simultaneous abatement of NO and N2O with CH4 over modified Al2O3 supported Pt,Pd,Rh
M. C. Campa;G. Fierro;
2020
Abstract
NO and N2O emissions represent a worldwide problem of immense concern and, therefore, due to increasing limits imposed by stricter legislation, many efforts are devoted to their catalytic abatement. NO and N2O are also formed in industrial processes, such as nitric and adipic acid plants, where they are removed sequentially. Considering the above, it can be interesting for practical applications to find a catalyst for the simultaneous abatement of NO and N2O, taking into account that its activity could be strongly affected by the amount of O2 in the exhaust stream. While there are many laboratory studies describing the abatement of either NO or N2O, i.e. in separate experiments, there are relatively few reports of catalysts that remove both pollutants simultaneously. Here we report some results on the reduction of both NO and N2O over Pt,Pd,Rh/Al2O3-SiO2 and Pt,Pd,Rh/Al2O3-ZrO2 catalysts using CH4 as reductant in the presence of different amounts of O2.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
