The passivating effects produced on Ni49Ti51 (at.%) shape memory alloy by electropolishing in methanol-sulphuric acid electrolyte or thermal treatment in air are investigated with ion-beam techniques (secondary ion mass spectrometry (SIMS) and mass resolved ion scattering spectrometry (MARISS)) and electrochemical techniques (polarisation curves, photocurrent spectroscopy and impedance). Electropolishing produces a limited passivation due to formation of a thin layer of amorphous TiO2, which causes only a slight hindrance to the oxygen evolution reaction. Thermal treatment in air at 450degreesC causes a more substantial passivation due to formation of a thick oxide layer, estimated at about 80 nm for a 16 h treatment on the basis of weight increase, disregarding roughness. Data indicate that the film produced by thermal oxidation has probably a duplex structure, with a porous outer layer with inclusions of Ni species and a compact inner layer, in contact with the substrate, consisting of (essentially) nickel free TiO2 rutile.

Characterisation of Surface Oxidation of Nickel-Titanium Alloy by Ion-beam and Electrochemical Techniques

Barison S;Cattarin S;Daolio S;Musiani M;Tuissi A
2004

Abstract

The passivating effects produced on Ni49Ti51 (at.%) shape memory alloy by electropolishing in methanol-sulphuric acid electrolyte or thermal treatment in air are investigated with ion-beam techniques (secondary ion mass spectrometry (SIMS) and mass resolved ion scattering spectrometry (MARISS)) and electrochemical techniques (polarisation curves, photocurrent spectroscopy and impedance). Electropolishing produces a limited passivation due to formation of a thin layer of amorphous TiO2, which causes only a slight hindrance to the oxygen evolution reaction. Thermal treatment in air at 450degreesC causes a more substantial passivation due to formation of a thick oxide layer, estimated at about 80 nm for a 16 h treatment on the basis of weight increase, disregarding roughness. Data indicate that the film produced by thermal oxidation has probably a duplex structure, with a porous outer layer with inclusions of Ni species and a compact inner layer, in contact with the substrate, consisting of (essentially) nickel free TiO2 rutile.
2004
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
shape memory alloys
passive films
electropolishing
photoelectrochemistry
impedance
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/53043
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