A high-intensity two-crystal four-220-reflection germanium monochromator is proposed for high-resolution X-ray diffraction. The beam divergence in the diffraction plane and the fractional wavelength band-pass are smaller by 40% than those of the well known Bartels monochromator, while the flux collected from the source is larger by a factor of five.

X-ray monochromator combining high resolution with high intensity

2002

Abstract

A high-intensity two-crystal four-220-reflection germanium monochromator is proposed for high-resolution X-ray diffraction. The beam divergence in the diffraction plane and the fractional wavelength band-pass are smaller by 40% than those of the well known Bartels monochromator, while the flux collected from the source is larger by a factor of five.
2002
Istituto per la Microelettronica e Microsistemi - IMM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/53201
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